Patterning in rapidly evaporated polymer solutions: Formation of annular structures under evaporation of the poor solvent

被引：13

作者：

Bormashenko, Edward ^{[1
]}

Pogreb, Roman

Musin, Albina

Stanevsky, Oleg

Bormashenko, Yelena

Whyman, Gene

Barkay, Zahava

机构：

[1] Coll Judea & Samaria, Inst Res, IL-44837 Ariel, Israel

[2] Tel Aviv Univ, Wolfson Appl Mat Res Ctr, IL-69978 Tel Aviv, Israel

来源：

JOURNAL OF COLLOID AND INTERFACE SCIENCE | 2006年 / 300卷 / 01期

关键词：

polymer solutions; poor solvent; viscous dewetting; annular structures; patterning; CONSTRUCTIVE NANOLITHOGRAPHY; FILMS; MEMBRANES;

D O I：

10.1016/j.jcis.2006.03.064

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

Patterning in the intensively evaporated polymer solutions based on polystyrene and poor solvent (acetone) was investigated. SEM and AFM studies demonstrated that annular elements of the surface topography are formed in this case, in contrast to the honeycomb patterns obtained under the evaporation of the good solvent (chloroform). The authors suggest that the theory of viscous dewetting developed by de Gennes explains the phenomenon satisfactorily. (c) 2006 Elsevier Inc. All rights reserved.

引用

页码：293 / 297

页数：5

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