Controlled electroplating for high-aspect-ratio zone-plate fabrication

被引:8
作者
Holmberg, A. [1 ]
Lindblom, M. [1 ]
Hertz, H. M. [1 ]
机构
[1] Royal Inst Technol, Albanova, Dept Appl Phys, SE-10691 Stockholm, Sweden
来源
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 2006年 / 24卷 / 06期
关键词
D O I
10.1116/1.2362761
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
The authors report a method for monitoring, control, and end-point detection of electroplating in nanostructures. The method is demonstrated on nickel plating into polymer molds, which is an important process in the fabrication of soft x-ray zone-plate diffractive optics. The lack of reproducibility presently limits the achievable nickel aspect ratio and, thus, reduces the zone-plate diffraction efficiency. The reported method provides reproducible plating via real-time control of the plating rate. It combines in situ light transmission measurements with current measurements to determine the thickness of the growing layer. The accuracy of the thickness prediction was better than +/- 4% (1 sigma) for 100-300 nm nickel layers. Furthermore, a slight change in the light transmission signal indicates when a gratinglike zone-plate structure is slightly overplated and the plating should be stopped. This end-point detection provides the optimal filling of high-aspect-ratio molds for improved diffraction efficiency. (c) 2006 American Vacuum Society.
引用
收藏
页码:2592 / 2596
页数:5
相关论文
共 16 条
[1]   Specialized electron beam nanolithography for EUV and X-ray diffractive optics [J].
Anderson, EH .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 2006, 42 (1-2) :27-35
[2]  
Attwood D., 1999, SOFT XRAYS EXTREME U, P337
[3]  
Born M., 1999, PRINCIPLES OPTICS, P54
[4]   Soft X-ray microscopy at a spatial resolution better than 15nm [J].
Chao, WL ;
Harteneck, BD ;
Liddle, JA ;
Anderson, EH ;
Attwood, DT .
NATURE, 2005, 435 (7046) :1210-1213
[5]   High-efficiency multilevel zone plates for keV X-rays [J].
Di Fabrizio, E ;
Romanato, F ;
Gentili, M ;
Cabrini, S ;
Kaulich, B ;
Susini, J ;
Barrett, R .
NATURE, 1999, 401 (6756) :895-898
[6]   Nano-fabrication of condenser and micro-zone plates for compact X-ray microscopy [J].
Holmberg, A ;
Rehbein, S ;
Hertz, HM .
MICROELECTRONIC ENGINEERING, 2004, 73-4 :639-643
[7]   PHASE ZONE PLATES FOR X-RAYS AND EXTREME UV [J].
KIRZ, J .
JOURNAL OF THE OPTICAL SOCIETY OF AMERICA, 1974, 64 (03) :301-309
[8]   Substrate cooling efficiency during cryogenic inductively coupled plasma polymer etching for diffractive optics on membranes [J].
Olynick, DL ;
Anderson, EH ;
Harteneck, B ;
Veklerov, E .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2001, 19 (06) :2896-2900
[9]   High-efficiency nickel phase zone plates with 20 nm minimum outermost zone width [J].
Peuker, M .
APPLIED PHYSICS LETTERS, 2001, 78 (15) :2208-2210
[10]   Fabrication and characterization of a condenser zone plate for compact x-ray microscopy [J].
Rehbein, S ;
Holmberg, A ;
Johansson, GA ;
Jansson, PAC ;
Hertz, HM .
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2004, 22 (03) :1118-1122