Nano-fabrication of condenser and micro-zone plates for compact X-ray microscopy

被引:34
作者
Holmberg, A [1 ]
Rehbein, S [1 ]
Hertz, HM [1 ]
机构
[1] Royal Inst Technol, Biomed & Xray Phys, S-10691 Stockholm, Sweden
关键词
electron beam lithography; zone plates; X-ray optics;
D O I
10.1016/j.mee.2004.03.006
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We demonstrate nano-fabrication of high-aspect ratio and high-spatial frequency diffractive X-ray optics with high uniformity for use in a laser-plasma-based compact water-window X-ray microscope. The structures are fabricated on 50 nm thin Si3N4-membranes using a three-layer resist scheme and 30 keV e-beam lithography in combination with reactive ion etching and nickel electroplating. The process is developed on solely commercially available resists and instruments. As examples, we demonstrate fabrication of micro-zone plates with outermost linewidths of 30 nm and an uniform zone height of 160 nm, and a 4.5 mm diameter condenser zone plate with 50-60 nm lines, fabricated by using stitched fields. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:639 / 643
页数:5
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