Coulomb blockade in a silicon/silicon-germanium two-dimensional electron gas quantum dot

被引:46
作者
Klein, LJ [1 ]
Slinker, KA
Truitt, JL
Goswami, S
Lewis, KLM
Coppersmith, SN
van der Weide, DW
Friesen, M
Blick, RH
Savage, DE
Lagally, MG
Tahan, C
Joynt, R
Eriksson, MA
Chu, JO
Ott, JA
Mooney, PM
机构
[1] Univ Wisconsin, Madison, WI 53706 USA
[2] IBM Corp, Div Res, Thomas J Watson Res Ctr, Yorktown Hts, NY 10598 USA
关键词
D O I
10.1063/1.1751612
中图分类号
O59 [应用物理学];
学科分类号
摘要
We report the fabrication and electrical characterization of a single electron transistor in a modulation doped silicon/silicon-germanium heterostructure. The quantum dot is fabricated by electron beam lithography and subsequent reactive ion etching. The dot potential and electron density are modified by laterally defined side gates in the plane of the dot. Low temperature measurements show Coulomb blockade with a single electron charging energy of 3.2 meV. (C) 2004 American Institute of Physics.
引用
收藏
页码:4047 / 4049
页数:3
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