A spectroscopic ellipsometry study of TiO2 thin films prepared by ion-assisted electron-beam evaporation

被引:90
作者
Eiamchai, Pitak [1 ]
Chindaudom, Pongpan [2 ]
Pokaipisit, Artorn [1 ]
Limsuwan, Pichet [1 ]
机构
[1] King Mongkuts Univ Technol, Fac Sci, Dept Phys, Bangkok 10140, Thailand
[2] Natl Elect & Comp Technol Ctr, Photon Technol Lab, Pathum Thani 12120, Thailand
关键词
Titanium dioxide; Ellipsometry; Evaporation; TEMPERATURE; ENERGY;
D O I
10.1016/j.cap.2008.06.011
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Film characterization based on variable-angle spectroscopic ellipsometry (VASE) is desirable in order to understand physical and optical characteristics of thin films. A number of TiO2 film samples were prepared by ion-assisted electron-beam evaporation with 200-nm nominal thickness, 2.0 A/s deposition rate and 8 sccm oxygen flow rate. The samples were maintained at 250 C during the deposition, and annealed in air atmosphere afterwards. As-deposited and annealed films were analyzed by VASE, spectrophotoscopy and X-ray diffractometry. From ellipsometry modeling process, the triple-layer physical model and the Cody-Lorentz dispersion model offer the best results. The as-deposited films are inhomogeneous, with luminous transmittance and band gap of 62.37% and 2.95 eV. The 300 degrees C and 500 degrees C are transition temperatures toward anatase and rutile phases, respectively. Increasing temperature results in an increase of refractive index, transmittance percentage and band gap energy. At 500 degrees C, the highest refractive index and band gap energy are obtained at 2.62 and 3.26 eV, respectively. The developed VASE-modeling process should be able to characterize other TiO2 films, using similar physical and optical modeling considerations. (C) 2008 Elsevier B.V. All rights reserved.
引用
收藏
页码:707 / 712
页数:6
相关论文
共 25 条
[1]   Anomalous effect of temperature on atomic layer deposition of titanium dioxide [J].
Aarik, J ;
Aidla, A ;
Mändar, H ;
Sammelselg, V .
JOURNAL OF CRYSTAL GROWTH, 2000, 220 (04) :531-537
[2]   Study of TiO2 film growth mechanisms in low-pressure plasma by in situ real-time spectroscopic ellipsometry [J].
Amassian, A ;
Desjardins, P ;
Martinu, L .
THIN SOLID FILMS, 2004, 447 :40-45
[3]   MAGNETIC-PROPERTIES OF THE ANATASE PHASE OF TIO2 [J].
CHAUVET, O ;
FORRO, L ;
KOS, I ;
MILJAK, M .
SOLID STATE COMMUNICATIONS, 1995, 93 (08) :667-669
[4]   Effects of annealing on titanium dioxide structured films [J].
Colgan, MJ ;
Djurfors, B ;
Ivey, DG ;
Brett, MJ .
THIN SOLID FILMS, 2004, 466 (1-2) :92-96
[5]   The surface science of titanium dioxide [J].
Diebold, U .
SURFACE SCIENCE REPORTS, 2003, 48 (5-8) :53-229
[6]   Analytical model for optical functions of amorphous semiconductors and its implications for thin film solar cells [J].
Ferlauto, AS ;
Ferreira, GM ;
Pearce, JM ;
Wronski, CR ;
Collins, RW ;
Deng, X ;
Ganguly, G .
THIN SOLID FILMS, 2004, 455 :388-392
[7]  
FERLAUTO AS, 2001, THESIS PENNSYLVANIA
[8]   Optical characterization of TiO2 thin films by the combined method of spectroscopic ellipsometry and spectroscopic photometry [J].
Franta, D ;
Ohlídal, I ;
Petrydes, D .
VACUUM, 2005, 80 (1-3) :159-162
[9]   Development of hydrophilic outside mirror coated with titania photocatalyst [J].
Hata, S ;
Kai, Y ;
Yamanaka, I ;
Oosaki, H ;
Hirota, K ;
Yamazaki, S .
JSAE REVIEW, 2000, 21 (01) :97-102
[10]   Ultra-thin titanium oxide film with a rutile-type structure [J].
Hiratani, M ;
Kadoshima, M ;
Hirano, T ;
Shimamoto, Y ;
Matsui, Y ;
Nabatame, T ;
Torii, K ;
Kimura, S .
APPLIED SURFACE SCIENCE, 2003, 207 (1-4) :13-19