Two-dimensional photonic crystal waveguide obtained by e-beam direct writing of SU8-2000 photoresist

被引:29
作者
De Vittorio, M
Todaro, MT
Stomeo, T
Cingolani, R
Cojoc, D
Di Fabrizio, E
机构
[1] Univ Lecce, Dipartimento Ingn Innovaz, INFM, NNL, I-73100 Lecce, Italy
[2] INFM, TASC, NNL, I-34012 Trieste, Italy
关键词
polymeric photonic crystals; photoresist; electron-beam lithography;
D O I
10.1016/j.mee.2004.02.075
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
We report on the direct electron-beam patterning of a negative tone resist SU8-2000 for the fabrication of a two-dimensional photonic crystal (2D-PC) waveguide. The high refractive index of the SU8-2000 (about 1.69), its transparency above 360 nm, the good mechanical stability and the possibility of direct patterning by electron-beam lithography, make such resist ideal for the direct realization of high-resolution photonic crystal waveguides. The fabrication of a triangular array of sub-micron pillars (lattice constant of 300 nm and filling factor of 0.35) suitable for the realization of a 2D-PC waveguide on a glass substrate is reported. The energy dispersion diagram, calculated by the plane wave expansion technique, shows that this 2D-PC structure has a small photonic band gap (PBG) for the TM-like modes. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:388 / 391
页数:4
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