Excimer laser ablation of aluminum nitride

被引:16
作者
Lumpp, JK
Allen, SD
机构
[1] FLORIDA STATE UNIV,DEPT CHEM,TALLAHASSEE,FL 32306
[2] FLORIDA STATE UNIV,DEPT ELECT ENGN,TALLAHASSEE,FL 32306
关键词
D O I
10.1557/JMR.1997.0029
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Excimer laser wavelengths ablate aluminum nitride at rates up to 0.2 mu m/pulse where the rate increases with decreasing background pressure and increasing fluence. The ablation threshold for AlN at 248 nm is approximately 2 J/cm(2). Blind vias are produced with flat bottoms, straight walls, and a decomposed metallic layer remaining on the surface. Ablation rate dependence on fluence saturates at high fluences due to absorption by the ablation plume. The influence of processing variables on ablation rate and ablation mechanisms an discussed. Statistical design of experiments is used to compare data sets.
引用
收藏
页码:218 / 225
页数:8
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