Fabrication and patterning surface conductive porous glass

被引:6
作者
Dong, JQ [1 ]
Gafney, HD [1 ]
机构
[1] CUNY QUEENS COLL,DEPT CHEM & BIOCHEM,FLUSHING,NY 11367
基金
美国国家科学基金会;
关键词
D O I
10.1016/0022-3093(96)00366-3
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Electro-conductive indium tin oxide coatings have been deposited on porous glass without significant reduction in the porosity or transparency of the substrate. Typical films are similar to 3 mu m thickness with a sheet resistance of 1.0 k Omega and a light transmittance of > 85% in the 400 to 1200 nm region. Scanning electron microscopy (SEM) and X-ray diffraction show that the films are crystalline with particle size of about 20 nm. Patterning conductive regions has been demonstrated by photopatterning a photoresist onto the indium tin oxide film and acid-etching of the unprotected region.
引用
收藏
页码:329 / 333
页数:5
相关论文
共 15 条
[1]  
ADACHI K, 1990, J MATER SCI, V25, P1403
[2]  
[Anonymous], 1990, SEMICONDUCTOR MAT DE
[3]   PHOTOCHEMICAL METHOD TO PRODUCE WAVE-GUIDING IN GLASS [J].
BORRELLI, NF ;
COTTER, MD ;
LUONG, JC .
IEEE JOURNAL OF QUANTUM ELECTRONICS, 1986, 22 (06) :896-901
[4]   HIGHLY CONDUCTIVE, TRANSPARENT FILMS OF SPUTTERED IN2-XSNXO3-Y [J].
FRASER, DB ;
COOK, HD .
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1972, 119 (10) :1368-&
[5]  
GAFNEY HD, 1990, J MACROMOL SCI CHEM, VA27, P1187
[6]   INDIUM-TIN OXIDE THIN-FILMS BY METAL-ORGANIC DECOMPOSITION [J].
GALLAGHER, D ;
SCANLAN, F ;
HOURIET, R ;
MATHIEU, HJ ;
RING, TA .
JOURNAL OF MATERIALS RESEARCH, 1993, 8 (12) :3135-3144
[7]   CHEMICAL VAPOR-DEPOSITION OF TRANSPARENT ELECTRICALLY CONDUCTING LAYERS OF INDIUM OXIDE DOPED WITH TIN [J].
KANE, J ;
SCHWEIZER, HP ;
KERN, W .
THIN SOLID FILMS, 1975, 29 (01) :155-163
[8]  
LUONG JC, 1987, MATER RES SOC S P, V75, P671
[9]   SOL-GEL DERIVED, AIR-BAKED INDIUM AND TIN OXIDE-FILMS [J].
MATTOX, DM .
THIN SOLID FILMS, 1991, 204 (01) :25-32
[10]  
MESSIER J, 1989, NONLINEAR OPTICAL EF, P277