Effect of damage production rate in aluminium surface treatment using an ECR-PBII apparatus

被引:3
作者
Bolduc, M [1 ]
Popovici, D [1 ]
Stansfield, BL [1 ]
Terreault, B [1 ]
机构
[1] Univ Quebec, INRS Energie & Mat, Varennes, PQ J3X 1S2, Canada
基金
加拿大自然科学与工程研究理事会;
关键词
photoelectron spectroscopy; plasma source ion implantation; radiation-enhanced diffusion; aluminium;
D O I
10.1016/S0257-8972(02)00122-6
中图分类号
TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
The damage production rate is an important factor in the diffusion of different species during implantation, for instance O-ion PBII of Al and its alloys. In this experiment, we try to distinguish the effect of purely radiation-enhanced diffusion (RED) from the synergistic effect between RED and Mg segregation driven by oxidation observed in earlier work with Mg-containing Al alloys. We investigated the influence of the irradiation damage on pure Al for which no segregation effect can occur. We used different gas compositions [O-2, Ar, Ar(10%O-2) and Ne(10%O-2)] to provide Simultaneous species implantation and a variable ratio of damage to active ion implantation rate. The effect of the damage rate on the 0 implanted profiles was, measured by XPS. Following implantation with an Ar(10%O-2) plasma, a very significant inward displacement of the peak concentration was observed. Analysis of the profiles leads to the conclusion that a purely RED effect is involved in this O migration. (C) 2002 Elsevier Science B.V. All rights reserved.
引用
收藏
页码:162 / 165
页数:4
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