Surface treatment of pure and alloyed aluminum using a new plasma-based ion implanter apparatus

被引：7

作者：

Popovici, D ^{[1
]}

Terreault, B ^{[1
]}

Bolduc, M ^{[1
]}

Paynter, RW ^{[1
]}

Ross, GG ^{[1
]}

Sarkissian, AH ^{[1
]}

Stansfield, BL ^{[1
]}

机构：

[1] Univ Quebec, INRS Energie & Mat, Varennes, PQ J3X 1S2, Canada

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 02期

关键词：

D O I：

10.1116/1.590651

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The characterization of an upgraded and flexible plasma-based ion implanter has been initiated; in terms of dose rate,uniformity, and control of the implant profile. In this article,,we report the preliminary results of a comparative study of different means of hardening aluminium and reducing its friction coefficient, with an emphasis on microcharacterization [Auger electron spectroscopy (AES) and Rutherford backscattering spectroscopy depth profiling, x-ray photoelectron spectroscopy (XPS), and scanning force microscopy (SFM)]. In particular we present an AES study of the N and O depth profiles produced in Al by our system; an XPS characterization of the stoichiometry and bond chemistry of ion nitrided Al; and a SFM study of the respective roles of roughness and atomic forces in friction on the N-implanted samples. (C) 1999 American Vacuum Society. [S0734-211X(99)02902-9].

引用

页码：859 / 862

页数：4

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