Fabrication of Anodic Porous Alumina by Squaric Acid Anodizing

被引:48
作者
Kikuchi, Tatsuya [1 ]
Yamamoto, Tsuyoshi [1 ]
Natsui, Shungo [1 ]
Suzuki, Ryosuke O. [1 ]
机构
[1] Hokkaido Univ, Fac Engn, Kita Ku, Sapporo, Hokkaido 0608628, Japan
基金
日本学术振兴会;
关键词
Aluminum; Anodizing; Anodic Porous Alumina; Squaric Acid; Nanostructure fabrication; LASER IRRADIATION; PHOTONIC CRYSTALS; OXIDE; GROWTH; ARRAYS; FILMS; ANODIZATION; MEMBRANES; BILAYERS; PH;
D O I
10.1016/j.electacta.2013.12.186
中图分类号
O646 [电化学、电解、磁化学];
学科分类号
081704 ;
摘要
The growth behavior of anodic porous alumina formed via anodizing in a new electrolyte, squaric acid (3,4-dihydroxy-3-cyclobutene-1,2-dione), is reported for the first time. A high-purity aluminum foil was anodized in a 0.1 M squaric acid solution at 293 K and a constant applied potential of 100-150 V. Anodic oxides grew on the aluminum foil at applied potentials of 100-120 V, but a burned oxide film was formed at higher voltage. Anodic porous alumina with a cell size of approximately 200-400 nm and sub-100-nm-scale pore diameter was successfully fabricated by anodizing in squaric acid. The cell size of the anodic oxide increased with anodizing time because of the uneven growth of the porous layer. The anodic porous alumina obtained by squaric acid anodizing consists of amorphous Al2O3 containing 5-6 at% carbon from the electrolyte. (C) 2014 Elsevier Ltd. All rights reserved.
引用
收藏
页码:14 / 22
页数:9
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