Nearly diffraction-limited line focusing of a hard-X-ray beam with an elliptically figured mirror

被引：62

作者：

Yamauchi, K

Yamamura, K

Mimura, H

Sano, Y

Saito, A

Souvorov, A

Yabashi, M

Tamasaku, K

Ishikawa, T

Mori, Y

机构：

[1] Osaka Univ, Dept Precis Sci, Suita, Osaka 5650871, Japan

[2] Osaka Univ, Res Ctr Ultraprecis Sci & Technol, Suita, Osaka 5650871, Japan

[3] SPring 8 Japan Synchrotron Radiat Res Inst, Mikazuki, Hyogo 6795198, Japan

[4] SPring 8 RIKEN, Mikazuki, Hyogo 6795148, Japan

来源：

JOURNAL OF SYNCHROTRON RADIATION | 2002年 / 9卷

关键词：

elastic emission machining; plasma chemical vaporization machining; coherent X-rays; submicrometre focusing; elliptical mirrors;

D O I：

10.1107/S0909049502012578

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 ; 080401 ; 081102 ;

摘要：

An elliptical mirror for X-ray microfocusing was manufactured using the new fabrication methods of elastic emission machining and plasma chemical vaporization machining. Surface profiles measured using stitching interferometry showed a maximum deviation around the ideal figure of 7 nm peak-to-valley. The mirror showed nearly diffraction-limited focusing performance, with a 200 nm line width at the focus. Wave-optical calculations, taking the measured surface profile into consideration, reproduced well the measured focusing properties both at and around the beam waist.

引用

页码：313 / 316

页数：4

共 27 条

[1] TIME-RESOLVED DETECTION OF X-RAYS USING LARGE-AREA AVALANCHE PHOTODIODES [J].