Optical pressure exerted on a dielectric film in the evanescent field of a Gaussian beam

被引：11

作者：

Chang, S ^{[1
]}

Kim, JT ^{[1
]}

Jo, JH ^{[1
]}

Lee, SS ^{[1
]}

机构：

[1] KOREA ADV INST SCI & TECHNOL,DEPT PHYS,TAEJON 305701,SOUTH KOREA

来源：

OPTICS COMMUNICATIONS | 1996年 / 129卷 / 5-6期

关键词：

radiation pressure; Gaussian beam; evanescent wave; optical trapping;

D O I：

10.1016/S0030-4018(96)00187-3

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We theoretically investigate the optical pressure for a dielectric film located in the evanescent field of a Gaussian beam. in our approach, we derive the electromagnetic fields at the boundaries of the film by solving the boundary-value problem for a system of four stratified media with the incidence of a Gaussian beam. We also formulate analytically the optical pressure exerted on a dielectric film by using the derived electromagnetic fields. Numerical results of the optical pressure by a Gaussian beam-generated evanescent wave are presented in comparison with the plane-wave results.

引用

页码：394 / 404

页数：11

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