X-ray photoelectron spectroscopy studies of CVD diamond films

被引:33
作者
Fan, Y [1 ]
Fitzgerald, AG
John, P
Troupe, CE
Wilson, JIB
机构
[1] Univ Dundee, Dept Elect Engn & Phys, Dundee DD1 4HN, Scotland
[2] Heriot Watt Univ, Dept Chem, Edinburgh EH14 4AS, Midlothian, Scotland
[3] Heriot Watt Univ, Dept Phys, Edinburgh EH14 4AS, Midlothian, Scotland
关键词
CVD diamond; amorphous carbon; graphite crystals; ion surface etching; x-ray photoelectron spectroscopy;
D O I
10.1002/sia.1392
中图分类号
O64 [物理化学(理论化学)、化学物理学];
学科分类号
070304 ; 081704 ;
摘要
In this research work, a comparative x-ray photoelectron spectroscopy (XPS) analysis has been performed on three allotropic carbon materials i.e. amorphous carbon films, graphite crystals and chemically vapour deposited (CVD) diamond films. These studies have shown that XPS is one of the most powerful techniques used to distinguish the diamond phase of carbon from the graphite and amorphous carbon components. In these investigations, particular attention has been paid to the effects of the post-deposition surface treatment on the diamond surfaces and the corresponding spectrum changes. The experimental results confirmed that ion surface cleaning destroys the original carbon atomic bonding configuration and implants argon atoms into the sample surface. The main spectral changes for amorphous carbon, graphite and diamond materials after the ion etching process can be attributed to bonding modification and the existence of argon contamination on the sample surfaces. Copyright (C) 2002 John Wiley Sons, Ltd.
引用
收藏
页码:703 / 707
页数:5
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