Low ballistic mobility in submicron HEMTs

被引:203
作者
Shur, MS [1 ]
机构
[1] Rensselaer Polytech Inst, Ctr Integrated Elect, Dept Elect Comp & Syst Engn, Troy, NY 12180 USA
[2] Rensselaer Polytech Inst, Dept Syst Engn, Troy, NY 12180 USA
关键词
ballistic effects; high electron mobility transistors (HEMTs); mobility;
D O I
10.1109/LED.2002.802679
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
Ballistic effects in short channel high electron mobility transistors (HEMTs) greatly reduce the field effect mobility compared to that in long gate structures. This reduction is related to a finite electron acceleration time in the channel under the device gate. As an example, the field effect mobility at room temperature in 0.15-mum gate AlGaAs/GaAs HEMTs cannot exceed 3000 cm(2)/V-s. These predictions are consistent with the values of the field effect mobility extracted from. the measured AlGaAs/GaAs HEMT current-voltage characteristics.
引用
收藏
页码:511 / 513
页数:3
相关论文
共 16 条
[1]   ELECTRON MOBILITIES IN MODULATION-DOPED SEMICONDUCTOR HETEROJUNCTION SUPER-LATTICES [J].
DINGLE, R ;
STORMER, HL ;
GOSSARD, AC ;
WIEGMANN, W .
APPLIED PHYSICS LETTERS, 1978, 33 (07) :665-667
[2]  
Dyakonov M., 1996, PHYSICS SEMICONDUCTO, P145
[3]  
Esaki L., 1969, RC2418 IBM
[4]  
FJELDLY TA, 1991, P 11 EUR MICR C STUT, P198
[5]   Transient electron transport in wurtzite GaN, InN, and AlN [J].
Foutz, BE ;
O'Leary, SK ;
Shur, MS ;
Eastman, LF .
JOURNAL OF APPLIED PHYSICS, 1999, 85 (11) :7727-7734
[6]   CONDUCTANCE OF SMALL SEMICONDUCTOR-DEVICES [J].
KASTALSKY, AA ;
SHUR, MS .
SOLID STATE COMMUNICATIONS, 1981, 39 (06) :715-718
[7]   Nonresonant detection of terahertz radiation in field effect transistors [J].
Knap, W ;
Kachorovskii, V ;
Deng, Y ;
Rumyantsev, S ;
Lü, JQ ;
Gaska, R ;
Shur, MS ;
Simin, G ;
Hu, X ;
Khan, MA ;
Saylor, CA ;
Brunel, LC .
JOURNAL OF APPLIED PHYSICS, 2002, 91 (11) :9346-9353
[8]   IMPEDANCE OF THIN SEMICONDUCTOR-FILMS IN LOW ELECTRIC-FIELD [J].
LEE, K ;
SHUR, MS .
JOURNAL OF APPLIED PHYSICS, 1983, 54 (07) :4028-4034
[9]  
LEE K, 1993, SEMICONDUCTOR DEVICE
[10]  
MIMURA T, 1980, JPN J APPL PHYS, V19, P225