Sub-microstructures formed by means of reactive ion etching in multilayers of two-dimensional fine-particle arrays

被引：7

作者：

Matsushita, SI

Yagi, Y

Fujishima, A

机构：

[1] RIKEN, Frontier Res Syst, Dissipat Hierarchy Struct Lab, Wako, Saitama 3510198, Japan

[2] Univ Tokyo, Dept Appl Chem, Bunkyo Ku, Tokyo 1138656, Japan

来源：

CHEMISTRY LETTERS | 2002年 / 05期

关键词：

D O I：

10.1246/cl.2002.524

中图分类号：

O6 [化学];

学科分类号：

0703 ;

摘要：

Highly attractive periodic sub-microstructures were formed in multilayers of two-dimensional fine-particle arrays by means of an oxygen-plasma etching technique. The enhancement of anisotropic etching in multilayers produced these attractive structures, since polystyrene particles (1 mum in diameter) in the top layer had worked as protective sidewalls at high power (over 100 W) and low pressure (20 mPa).

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页码：524 / 525

页数：2

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