Nanostructure array fabrication with a size-controllable natural lithography

A simple technique for size-controllable nanostructure array formation has been developed, using self-assembled polystyrene beads whose diameters can be arbitrarily reduced by reactive ion etching. We have produced a hole array of 83 and 157 nm diameter with 200 nm pitch on Si substrate, This technique can find potential applications in many areas of science and technology. (C) 1997 American Institute of Physics.