Fabrication of submicrometre 3D periodic structures composed of Si/SiO2

被引：108

作者：

Kawakami, S

机构：

[1] Res. Inst. of Elec. Communication, Tohoku University, Sendai-shi, Miyagi-ken, 980-77

来源：

ELECTRONICS LETTERS | 1997年 / 33卷 / 14期

关键词：

silicon dioxide; sputter etching;

D O I：

10.1049/el:19970844

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

The successful fabrication of 3D periodic structures composed of two transparent materials in the submicrometre range is reported for the first time. The material system comprises a-Si (n = 3.26) and SiO2 (n = 1.46), and sputter-etching leads to 'high-fidelity' layer-to-layer propagation of a concave-convex pattern.

引用

页码：1260 / 1261

页数：2

共 5 条

[1] All-silica single-mode optical fiber with photonic crystal cladding [J].