Anomalous ion channeling in AlInN/GaN bilayers: Determination of the strain state

被引:134
作者
Lorenz, K.
Franco, N.
Alves, E.
Watson, I. M.
Martin, R. W.
O'Donnell, K. P.
机构
[1] Inst Tecnol & Nucl, P-2686953 Sacavem, Portugal
[2] Univ Strathclyde, SUPA, Inst Photon, Glasgow G4 0NW, Lanark, Scotland
[3] Univ Strathclyde, Dept Phys, SUPA, Glasgow G4 0NG, Lanark, Scotland
关键词
D O I
10.1103/PhysRevLett.97.085501
中图分类号
O4 [物理学];
学科分类号
0702 ;
摘要
Monte Carlo simulations of anomalous ion channeling in near-lattice-matched AlInN/GaN bilayers allow an accurate determination of the strain state of AlInN by Rutherford backscattering or channeling. Although these strain estimates agree well with x-ray diffraction (XRD) results, XRD composition estimates are shown to have limited accuracy, due to a possible deviation from Vegard's law, which we quantify for this alloy. As the InN fraction increases from 13% to 19%, the strain in AlInN films changes from tensile to compressive with lattice matching predicted to occur at [InN]=17.1%.
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页数:4
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