Tin oxide growth in nanoporous silicon: an approach to an efficient solid state electrode

被引:6
作者
Roger, JA
Blanchin, MG
Canut, B
Teodorescu, VS
Letant, S
Vial, JC
机构
[1] Univ Lyon 1, CNRS, UMR 5586, Dept Phys Mat, F-69622 Villeurbanne, France
[2] Univ Grenoble 1, CNRS, UMR 5588, Spectrometrie Phys Lab, F-38402 St Martin Dheres, France
[3] Natl Inst Phys Mat, R-76900 Bucharest, Romania
关键词
D O I
10.1088/0268-1242/14/11/101
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
In this preliminary work, we show the ability of the Sol-Gel technique to introduce a solid phase into the nanopores of porous silicon. From RBS-C analysis, a complete incorporation of both tin and oxygen atoms over most of the porous layer thickness has been evidenced. TEM observations revealed the presence of small crystallites of cassiterite embedded in the porous layer. Providing that the silicon porosity does not exceed 70%, this solid phase does not degrade the skeleton of porous silicon and does not inhibit photoluminescence.
引用
收藏
页码:L29 / L32
页数:4
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