Phonon scattering mechanisms in suspended nanostructures from 4 to 40 K

被引:84
作者
Fon, W
Schwab, KC
Worlock, JM
Roukes, ML
机构
[1] CALTECH, Pasadena, CA 91125 USA
[2] Univ Maryland, Lab Phys Sci, College Pk, MD 20740 USA
[3] Univ Utah, Dept Phys, Salt Lake City, UT 84112 USA
来源
PHYSICAL REVIEW B | 2002年 / 66卷 / 04期
关键词
D O I
10.1103/PhysRevB.66.045302
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We have developed specially designed semiconductor devices for the measurement of thermal conductance in suspended nanostructures. By means of a novel subtractive comparison, we are able to deduce the phonon thermal conductance of individual nanoscale beams of different geometry and dopant profiles. The separate roles of important phonon scattering mechanisms are analyzed and a quantitative estimation of their respective scattering rates is obtained using the Callaway model. Diffuse surface scattering proves to be particularly important in the temperature range from 4 to 40 K. The rates of other scattering mechanisms, arising from phonon-phonon, phonon-electron, and phonon-point defect interactions, also appear to be significantly higher in nanostructures than in bulk samples.
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页码:1 / 5
页数:5
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