Detection of deposition rate of plasma-polymerized acrylate and methacrylate derivatives using quartz crystal microbalance

被引:13
作者
Kurosawa, S
Atthoff, B
Aizawa, H
Hilborn, J
机构
[1] Natl Inst Adv Ind Sci & Technol, AIST, Tsukuba, Ibaraki 3058565, Japan
[2] CNRS, Inst Phys & Chim Mat Strasbourg, F-67034 Strasbourg 2, France
[3] Univ Uppsala, Angstrom Lab, SE-75121 Uppsala, Sweden
[4] New Energy & Ind Technol Dev Org, Tokyo 1706028, Japan
关键词
plasma processing and deposition; quartz crystal microbalance; acrylate derivatives; plasma polymers; deposition rate;
D O I
10.1016/j.tsf.2003.12.008
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The deposition rates of plasma-polymerized (pp-)films of 12 acrylate derivatives (CH2=CHCOOR: substitution R is -H, -CH3, -CH=CH, -CH2CH3, -CH2CH2CH3, -(CH2)(3)CH3, -C(CH3)(3), -CH2CH(CH3)(2), -CH2(CH2)(4)CH3, -CH2CF3, -CH2CF2CF3, -CH2(CF2)(2)CF3), and 12 methacrylate derivatives (CH2=CCH3COOR': substitution R' is -H, -CH3, -CH=CH2, -CH2CH3, -CH2CH2CH3, -(CH2)(3)CH3, -C(CHA(3)) -CH2CH(CH3)(2), -CH2(CH2)(4)CH3, -CH2CF3, -CH2CF2CF3, -CH2(CF2)(2)CF3) are determined by the quartz crystal microbalance technique. Using the same polymerization conditions (100 W RF and 100 Pa vapor pressure) for the various monomers, it is found that the deposition rates were proportional to the polymerization time. The average deposition rate of pp-acrylate derivatives is larger than that of pp-methacrylate derivatives without pp-hexylacrylate. The average deposition rate of pp-fluoroalkylacrylates was higher than 7-25 times that of pp-alkylacrylate, and the average deposition rate of pp-fluoroalkylmethacrylates was higher than 10-31 times that of pp-alkylmethacrylates, respectively. The average deposition rate of pp-film depends on the chemical structure of the monomer suggesting different mechanisms under plasma-polymerization. (C) 2003 Elsevier B.V. All rights reserved.
引用
收藏
页码:26 / 33
页数:8
相关论文
共 24 条
[1]  
BIEDDRMAN H, 1992, PLASMA POLYM PROCESS, pCH7
[2]  
FILLER R, 1990, FLUORINE CHEM REV, V8, pCH1
[3]  
INAGAKI N, 1996, PLASMA SURFACE MODIF, pCH5
[4]  
INAGAKI N, 1981, J APPL POLYM SCI, V26, P3557
[5]  
IRIYAMA Y, 1990, POLYM MAT SCI ENG, V62, P162
[6]  
ISHIKAWA N, 1979, KODANSHYA SCI TOKYO, pCH5
[7]  
ISHIZUKA M, 1988, HIGH PERFORMANCE PAI, P15
[8]   EFFECTS OF MONOMER FLOW-RATE, FLOW CONFIGURATION, AND REACTOR GEOMETRY ON RATE OF PLASMA POLYMERIZATION [J].
KOBAYASHI, H ;
BELL, AT ;
SHEN, M .
JOURNAL OF MACROMOLECULAR SCIENCE-CHEMISTRY, 1976, A 10 (03) :491-500
[9]   OSCILLATING FREQUENCY OF PIEZOELECTRIC QUARTZ CRYSTAL IN SOLUTIONS [J].
KUROSAWA, S ;
TAWARA, E ;
KAMO, N ;
KOBATAKE, Y .
ANALYTICA CHIMICA ACTA, 1990, 230 (01) :41-49
[10]   Detection of deposition rate of plasma-polymerized silicon-containing films by quartz crystal microbalance [J].
Kurosawa, S ;
Aizawa, H ;
Miyake, J ;
Yoshimoto, M ;
Hilborn, J ;
Talib, ZA .
THIN SOLID FILMS, 2002, 407 (1-2) :1-6