Elementary processes and kinetics of H2 plasmas for different technological applications

被引：56

作者：

Capitelli, M ^{[1
]}

Celiberto, R

Esposito, F

Laricchiuta, A

Hassouni, K

Longo, S

机构：

[1] Univ Bari, IMIP, CNR, Sect Bari, I-70121 Bari, Italy

[2] Univ Bari, Dept Chem, I-70121 Bari, Italy

[3] Politecn Bari, DICA, Bari, Italy

[4] Univ Paris 13, CNRS, LIMHP, F-93430 Villetaneuse, France

来源：

PLASMA SOURCES SCIENCE & TECHNOLOGY | 2002年 / 11卷 / 3A期

关键词：

D O I：

10.1088/0963-0252/11/3A/302

中图分类号：

O35 [流体力学]; O53 [等离子体物理学];

学科分类号：

070204 ; 080103 ; 080704 ;

摘要：

Recent studies on elementary processes relevant to H-2 plasmas are reviewed, emphasizing, in particular, vibrational state selected electron-molecule and heavy particle-molecule interactions. These data are then discussed in the framework of plasma kinetics for reactors of technological applications. Particular emphasis is given to microwave and parallel-plate RF discharges.

引用

收藏

页码：A7 / A25

页数：19

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