Bonding configurations in DBOP-FCVA nitrogenated tetrahedral amorphous carbon films studied by Raman and X-ray photoelectron spectroscopies

被引：26

作者：

Roy, SS ^{[1
]}

Papakonstantinou, P ^{[1
]}

McCann, R ^{[1
]}

Abbas, G ^{[1
]}

Quinn, JP ^{[1
]}

McLaughlin, J ^{[1
]}

机构：

[1] Univ Ulster, Sch Elect & Mech Engn, NIBEC, Newtownabbey BT37 0QB, Antrim, North Ireland

来源：

关键词：

amorphous carbon nitride; XPS; Raman; nanoindentation;

D O I：

10.1016/j.diamond.2003.11.085

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Nitrogenated tetrahedral amorphous carbon (ta-C:N) films having nitrogen content from 0 to 10.3 at.%, have been produced by a double bend off-plane filtered cathodic vacuum arc system. X-ray photoelectron and Raman spectroscopies have been applied to study the effect of nitrogen in the bonding structure in the films. Deconvolution of the XPS spectra revealed a decrease in the amount of sp(3)-bonded carbon in the ta-C:N films. A comparative study between the Raman parameters at 514 and at 633 run excitation wavelength was presented. Nitrogen (N) incorporation led to a lower G peak position and higher I-D/I-G ratios, indicating the development of larger sp(2) domains. Q (-ve) parameter (which measures the skewness of G line) increased sharply with the increased of N content in the films. The hardness of the films was evaluated by nanoindentation. (C) 2003 Elsevier B.V All rights reserved.

引用

页码：1459 / 1463

页数：5

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