Electron temperature and density profiles in a neutral loop discharge plasma

被引:19
作者
Sakoda, T [1 ]
Iwamiya, H [1 ]
Uchino, K [1 ]
Muraoka, K [1 ]
Itoh, M [1 ]
Uchida, T [1 ]
机构
[1] ULVAC JAPAN LTD,CHIGASAKI,KANAGAWA 253,JAPAN
来源
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS | 1997年 / 36卷 / 1AB期
关键词
processing plasma; neutral loop discharge; Thomson scattering; electron temperature; electron density; magnetic field strength;
D O I
10.1143/JJAP.36.L67
中图分类号
O59 [应用物理学];
学科分类号
摘要
Thomson scattering measurements of electron temperature and density in a neutral loop discharge (NLD) plasma were performed in order to reveal electron behavior around the neutral loop. The method yielded unambiguous and reliable results: enabling quantitative analyses of particle balance to be made. The results showed that the electron temperature had a peak on the neutral loop and, in contrast, the electron density had a peak at a position radially inward from the neutral loop. We suggest that charged particles are produced by electron impact ionization of argon atoms on the neutral loop and then flow radially inward. The effect of the magnetic field strength on the NLD plasma formation is also discussed.
引用
收藏
页码:L67 / L69
页数:3
相关论文
共 5 条
[1]   THOMSON SCATTERING MEASUREMENTS OF ELECTRON-TEMPERATURE AND DENSITY IN AN ELECTRON-CYCLOTRON RESONANCE PLASMA [J].
BOWDEN, MD ;
OKAMOTO, T ;
KIMURA, F ;
MUTA, H ;
UCHINO, K ;
MURAOKA, K ;
SAKODA, T ;
MAEDA, M ;
MANABE, Y ;
KITAGAWA, M ;
KIMURA, T .
JOURNAL OF APPLIED PHYSICS, 1993, 73 (06) :2732-2738
[2]   LASER LIGHT SCATTERING IN LABORATORY PLASMAS [J].
EVANS, DE ;
KATZENSTEIN, J .
REPORTS ON PROGRESS IN PHYSICS, 1969, 32 (02) :207-+
[3]   USEFULNESS OF MAGNETIC NEUTRAL LOOP DISCHARGE PLASMA IN PLASMA PROCESSING [J].
TSUBOI, H ;
ITOH, M ;
TANABE, M ;
HAYASHI, T ;
UCHIDA, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (5A) :2476-2481
[4]   APPLICATION OF RADIOFREQUENCY DISCHARGED PLASMA PRODUCED IN CLOSED MAGNETIC NEUTRAL LINE FOR PLASMA PROCESSING [J].
UCHIDA, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS, 1994, 33 (1A) :L43-L44
[5]   PLASMA PRODUCTION USING ENERGETIC MEANDERING ELECTRONS [J].
YOSHIDA, Z ;
UCHIDA, T .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (8A) :4213-4216