Probing carbon nanoparticles in CNx thin films using Raman spectroscopy -: art. no. 035406

被引：46

作者：

Roy, D

Chhowalla, M

Hellgren, N

Clyne, TW

Amaratunga, GAJ

机构：

[1] Univ Cambridge, Dept Mat Sci & Met, Cambridge CB2 3QZ, England

[2] Univ Cambridge, Dept Engn, Cambridge CB2 1PZ, England

[3] Univ Illinois, Frederick Seitz Mat Res Lab, Urbana, IL 61801 USA

来源：

PHYSICAL REVIEW B | 2004年 / 70卷 / 03期

关键词：

D O I：

10.1103/PhysRevB.70.035406

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Carbon nitride films prepared by magnetron sputtering were studied by multiwavelength Raman spectroscopy. The low/intermediate wavenumber features observed near 400 and 700 cm(-1) are addressed, and the relaxation of the Raman selection rule due to curvature of the graphene planes in the nanoparticles (similar to carbon nanoonions) embedded in CNx thin films is invoked to explain the possible origin of the near 700 cm(-1) band. The shift in the G peak center and I-D/I-G ratio are correlated with the observed microstructural changes (published before) in order to understand the effect of nitrogenation and deposition temperature on the structure of the films.

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页码：035406 / 1

页数：6

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