CF4 glow discharge modification of CH4 plasma polymer layers deposited onto asymmetric polysulfone gas separation membranes

被引:12
作者
Hopkins, J [1 ]
Badyal, JPS [1 ]
机构
[1] UNIV DURHAM,DEPT CHEM,SCI LABS,DURHAM DH1 3LE,ENGLAND
关键词
D O I
10.1021/la951062j
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
Post CF4 glow discharge modification of methane plasma polymer layers deposited onto asymmetric polysulfone membranes has been investigated by XPS, FTIR, AFM, and gas permeability measurements. Oxygen and nitrogen gas permeability and permselectivity through the polysulfone substrate are found to be strongly influenced by the plasma processing parameters.
引用
收藏
页码:4205 / 4210
页数:6
相关论文
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