The analysis of a thin SiO2/Si3N4/SiO2 stack:: A comparative study of low-energy heavy ion elastic recoil detection, high-resolution Rutherford backscattering, and secondary ion mass spectrometry

被引：5

作者：

Brijs, B.

Sajavaara, T.

Giangrandi, S.

Janssens, T.

Conard, T.

Arstila, K.

Nakajima, K.

Kimura, K.

Bergmaier, A.

Dollinger, G.

Vantomme, A.

Vandervorst, W.

机构：

[1] IMEC, B-3001 Louvain, Belgium

[2] KULeuven, IKS, B-3001 Louvain, Belgium

[3] Katholieke Univ Leuven, INSYS, B-3001 Heverlee, Belgium

[4] Univ Helsinki, Accelerator Lab, FIN-00014 Helsinki, Finland

[5] Kyoto Univ, Dept Microengn, Sakyo Ku, Kyoto 6068501, Japan

[6] Univ Bundeswehr Munchen, Neubiberg, Germany

来源：

NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS | 2006年 / 249卷

关键词：

ERDA; thin film analysis; light elements; microelectronics;

D O I：

10.1016/j.nimb.2006.03.191

中图分类号：

TH7 [仪器、仪表];

学科分类号：

0804 [仪器科学与技术]; 080401 [精密仪器及机械]; 081102 [检测技术与自动化装置];

摘要：

The analysis of thin films in the range of 10 nm and less has become very important in microelectronics. The goal of this article is an evaluation of low-energy TOF-ERDA (time-of-flight elastic recoil detection analysis) in comparison with low-energy SIMS (secondary ion mass spectrometry) and HRBS (high-resolution Rutherford backscattering spectrometry), using a thin SiO2/Si3N4/SiO2 stack as a test vehicle. Comparisons are made on the depth resolution, its loss as a function of depth and the quantification accuracy. (c) 2006 Elsevier B.V. All rights reserved.

引用

页码：847 / 850

页数：4

共 6 条

[1]

Monte Carlo simulation of multiple and plural scattering in elastic recoil detection [J].