Low loss etchless silicon photonic waveguides

被引：234

作者：

Cardenas, Jaime ^{[1
]}

Poitras, Carl B. ^{[1
]}

Robinson, Jacob T. ^{[1
]}

Preston, Kyle ^{[1
]}

Chen, Long ^{[1
]}

Lipson, Michal ^{[1
]}

机构：

[1] Cornell Univ, Dept Elect & Comp Engn, Ithaca, NY USA

来源：

OPTICS EXPRESS | 2009年 / 17卷 / 06期

基金：

美国国家科学基金会;

关键词：

FABRICATION; WIRES;

D O I：

10.1364/OE.17.004752

中图分类号：

O43 [光学];

学科分类号：

070207 ; 0803 ;

摘要：

We demonstrate low loss silicon waveguides fabricated without any silicon etching. We define the waveguides by selective oxidation which produces ultra-smooth sidewalls with width variations of 0.3 nm. The waveguides have a propagation loss of 0.3 dB/cm at 1.55 mu m. The waveguide geometry enables low bending loss of approximately 0.007 dB/bend for a 90 degrees bend with a 50 mu m bending radius.(C) 2009 Optical Society of America

引用

页码：4752 / 4757

页数：6

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