Off-axis pulsed laser deposition system for epitaxial oxide growth on substrates up to 2 inches in diameter

被引:17
作者
Siegert, M [1 ]
Zander, W [1 ]
Lisoni, J [1 ]
Schubert, J [1 ]
Buchal, C [1 ]
机构
[1] Forschungszentrum Julich, Inst Schicht & Ionentech, D-52425 Julich, Germany
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 1999年 / 69卷 / Suppl 1期
关键词
D O I
10.1007/s003390051528
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
A novel off-axis pulsed-laser deposition (PLD) system for ferroelectric oxide thin films has been developed. The substrates are mounted "upside-down" and are rotating. The maximum substrate size is 2 inches in diameter. The optical and structural properties of the grown BaTiO(3) films are compared to the films produced by an on-axis PLD system. The stoichiometry and thickness were checked with Rutherford backscattering spectrometry (RBS). The crystalline quality and orientation were investigated with X-ray diffraction (XRD) and Rutherford backscattering spectrometry in channeling configuration (RBS/C). Using atomic force microscopy, the rms surface roughness was measured. The BaTiO(3) films grown on MgO form a planar optical waveguide. The optical losses and the refractive indices of these waveguides were determined with a prism coupling setup. Films grown on Id x 10 mm(2) MgO (100) substrates in on-axis geometry show optical waveguide losses less than 3 dB/cm.
引用
收藏
页码:S779 / S781
页数:3
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