A positive temperature coefficient of resistivity effect from a paraelectric Pt/(Ba-0.5,Sr-0.5)TiO3/IrO2 thin-film capacitor

被引:32
作者
Hwang, CS
Lee, BT
Cho, HJ
Lee, KH
Kang, CS
Hideki, H
Lee, SI
Lee, MY
机构
[1] Samsung Electronics Co., Semiconductor R and D Center, Yongin-Si, Kyungki-Do, 449-900
关键词
D O I
10.1063/1.119540
中图分类号
O59 [应用物理学];
学科分类号
摘要
A (Ba-0.5,Sr-0.5)TiO3 (BST) thin film was deposited on IrO2 thin-him electrode by a rf magnetron sputtering method. Top Pt electrode was deposited on the BST film to make a planar structured capacitor. The BST thin film showed paraelectric behavior at room temperature. A positive temperature coefficient of resistivity (PTCR) effect was observed when the conduction electrons were injected from the IrO2 electrode to BST, while Schottky emission behavior was observed when they were injected from the Pt electrode to BST. The electrical double layer formed at the Pt/PST interface results in the PTCR effect. A model that can explain the asymmetrical conduction behavior with respect to the bias polarity is suggested based on the energy band configurations at the interfaces with the electrodes. (C) 1997 American Institute of Physics.
引用
收藏
页码:371 / 373
页数:3
相关论文
共 13 条
[1]  
Cheol Seong Hwang, 1996, Integrated Ferroelectrics, V13, P157, DOI 10.1080/10584589608013090
[2]  
CHO HJ, 1997, JPN J APPL PHYS PT 1, V36, P197
[3]   ELECTRICAL-PROPERTIES OF PARAELECTRIC (PB0.72LA0.28)TIO3 THIN-FILMS WITH HIGH LINEAR DIELECTRIC PERMITTIVITY - SCHOTTKY AND OHMIC CONTACTS [J].
DEY, SK ;
LEE, JJ ;
ALLURI, P .
JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1995, 34 (6A) :3142-3152
[4]   BARIUMTITANAT ALS SPERRSCHICHTHALBLEITER [J].
HEYWANG, W .
SOLID-STATE ELECTRONICS, 1961, 3 (01) :51-58
[5]   RESISTIVITY ANOMALY IN DOPED BARIUM TITANATE [J].
HEYWANG, W .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1964, 47 (10) :484-490
[6]   THE POSITIVE TEMPERATURE-COEFFICIENT OF RESISTIVITY IN BARIUM-TITANATE [J].
HUYBRECHTS, B ;
ISHIZAKI, K ;
TAKATA, M .
JOURNAL OF MATERIALS SCIENCE, 1995, 30 (10) :2463-2474
[7]  
HWANG CS, UNPUB J APPL PHYS
[8]  
Kulwicki B.M., 1981, ADV CERAM, V1, P138
[9]  
LAGRANGE A, 1991, PRESENT FUTURE ZINC, P9
[10]  
ROBLEE LS, 1986, MATER RES SOC S P, V55, P303