Fabrication of carbon nanowalls using novel plasma processing

被引：90

作者：

Hiramatsu, Mineo ^{[1
]}

Hori, Masaru

机构：

[1] Meijo Univ, Dept Elect & Elect Engn, Nano Fact, Nagoya, Aichi 4688502, Japan

[2] Nagoya Univ, Dept Elect Engn & Comp Sci, Nagoya, Aichi 4648603, Japan

来源：

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS | 2006年 / 45卷 / 6B期

关键词：

carbon nanowalls; plasma-enhanced CVD; radical injection; graphite;

D O I：

10.1143/JJAP.45.5522

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Carbon nanowalls (CNWs), i.e., two-dimensional carbon nanostructures, were fabricated using fluorocarbon capacitively coupled plasma-enhanced chemical vapor deposition assisted by H radical injection. The correlation between CNW growth and the fabrication conditions was investigated. The morphologies of CNWs were dependent on the types of carbon source gases and the amount of H radicals injected. Moreover, straight and aligned CNWs with regular spacing were fabricated on the substrate set perpendicular to the electrode. In addition, H and CFx (x = 1-3) radical densities in the plasma were measured using vacuum ultraviolet absorption spectroscopy and appearance mass spectrometry, respectively, to clarify the growth mechanism of CNWs. The density ratio of H radicals to CFx radicals was found to be an important factor responsible for the formation of CNWs from fluorocarbon/hydrogen systems and increased drastically as a result of H radical injection.

引用

页码：5522 / 5527

页数：6

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