Soft X-ray photoelectron microscopy used for the characterization of diamond, a-C and CNx, thin films

被引：13

作者：

Ziethen, C

Wegelin, F

Schönhense, G

Ohr, R

Neuhäuser, M

Hilgers, H

机构：

[1] Johannes Gutenberg Univ Mainz, Inst Phys, D-55099 Mainz, Germany

[2] IBM Speichersyst Deutschland GMBH, Mainz, Germany

来源：

关键词：

coating; electron microscopy; electron spectroscopy; microstructure; a-C; CNx; diamond;

D O I：

10.1016/S0925-9635(01)00597-0

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

This article gives an overview about the application of X-ray photoemission electron microscopy (X-PEEM) used for the analysis of carbon thin films. We present the results of an X-ray absorption near edge structure (XANES) study of CVD diamond, a-C and CNx films on Si (100) as well as a defect analysis of a hard disc scratch test. The sp(2)/sp(3) ratio of the carbon films was determined and mapped in the electron micrographs, which show localized defects in the surface. (C) 2002 Elsevier Science B.V. All rights reserved.

引用

页码：1068 / 1073

页数：6

共 18 条

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ADE H, 1997, J ELECT SPECTR RELAT, V84

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