Electron beam irradiation of hydrogenated amorphous carbon films

被引：14

作者：

Calliari, L ^{[1
]}

Filippi, M ^{[1
]}

Laidani, N ^{[1
]}

机构：

[1] IRST, ITC, Ctr Ric Sci & Tecnol, I-38050 Povo, Trento, Italy

来源：

SURFACE AND INTERFACE ANALYSIS | 2004年 / 36卷 / 08期

关键词：

hydrogenated amorphous carbon; electron irradiation; electron spectroscopy; graphitization;

D O I：

10.1002/sia.1856

中图分类号：

O64 [物理化学（理论化学）、化学物理学];

学科分类号：

070304 ; 081704 ;

摘要：

The effect of electron irradiation on hydrogenated amorphous carbon (a-C: H) films is investigated on both as-deposited and thermally annealed films and is compared to the effect of thermal annealing. As for the as-deposited film, both electron irradiation and thermal annealing result in a change in the film structure from diamond-like to graphite-like. In the case of electron irradiation, such a phase transformation proceeds in a logarithmic way as a function of the electron dose. No electron-induced effect is observed on previously annealed films. Copyright (C) 2004 John Wiley Sons, Ltd.

引用

页码：1126 / 1129

页数：4

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