Native defects and impurities in InN:: First-principles studies using the local-density approximation and self-interaction and relaxation-corrected pseudopotentials

被引:193
作者
Stampfl, C
Van de Walle, CG
Vogel, D
Krüger, P
Pollmann, J
机构
[1] Xerox Corp, Palo Alto Res Ctr, Palo Alto, CA 94304 USA
[2] Univ Munster, Inst Theoret Phys 2, D-48149 Munster, Germany
来源
PHYSICAL REVIEW B | 2000年 / 61卷 / 12期
关键词
D O I
10.1103/PhysRevB.61.R7846
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
We perform first-principles density-functional calculations to investigate the electronic and atomic structure and formation energies of native defects and selected impurities (O, Si, and Mg) in InN. For p-type material, the nitrogen vacancy has the lowest formation energy. In n-type material all defect formation energies are high. We discuss the effect of the band-gap underestimate in density functional theory (DFT), and compare the defect electronic structure obtained using DFT (in the local-density approximation LDA) with a recently developed self-interaction and relaxation-corrected (SIRC) pseudopotential treatment. The SIRC calculations affect the positions of some of the defect states in the band gap, but the general conclusions obtained from the standard DFT-LDA calculations remain valid.
引用
收藏
页码:R7846 / R7849
页数:4
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