Low-temperature fabrication of high-quality (Ba,Sr)TiO3 films using charged liquid cluster beam method

被引：8

作者：

Choi, H ^{[1
]}

Park, S

Yang, Y

Kang, H

Kim, K

机构：

[1] Univ Illinois, Dept Elect & Comp Engn, Micro & Nanotechnol Lab, Urbana, IL 61801 USA

[2] Univ Illinois, Dept Elect & Comp Engn, Thin Film & Charged Particle Res Lab, Urbana, IL 61801 USA

[3] Univ Illinois, Dept Mat Sci & Engn, Thin Film & Charged Particle Res Lab, Urbana, IL 61801 USA

[4] Korea Univ, Dept Elect Engn, Seoul 136701, South Korea

[5] Korea Univ, Div Chem & Mol Engn, Seoul 136701, South Korea

来源：

JOURNAL OF MATERIALS RESEARCH | 2002年 / 17卷 / 08期

基金：

美国能源部;

关键词：

D O I：

10.1557/JMR.2002.0279

中图分类号：

T [工业技术];

学科分类号：

08 ;

摘要：

Low-temperature deposition of high-quality (Ba,Sr)TiO3 (BST) thin films was achieved in air on Pt/Ti/SiO2/Si substrates using the charged liquid cluster beam (CLCB) method. The Ba, Sr, and Ti precursors were synthesized using alkoxy carboxylate ligands to tailor their physical properties to the CLCB process. The as-deposited BST films fabricated at substrate temperatures as low as 280 degreesC exhibited high purity. The leakage current density and dielectric constant of the film, deposited at 300 degreesC and subsequently annealed at 700 degreesC, were 2.5 x 10(-9) A/cm(2) at 1.5 V and 305, respectively.

引用

页码：1888 / 1891

页数：4

共 11 条

[1] Deposition of (Zn,Mn)2SiO4 for plasma display panels using charged liquid cluster beam [J].

Cich, M ;

Kim, K ;

Choi, H ;

Hwang, ST .

APPLIED PHYSICS LETTERS, 1998, 73 (15) :2116-2118

[2] Perovskite thin films for high-frequency capacitor applications [J].

Dimos, D ;

Mueller, CH .

ANNUAL REVIEW OF MATERIALS SCIENCE, 1998, 28 :397-419

[3] Progress in the developments of (Ba,Sr)TiO3 (BST) thin films for Gigabit era DRAMs [J].

Ezhilvalavan, S ;

Tseng, TY .

MATERIALS CHEMISTRY AND PHYSICS, 2000, 65 (03) :227-248

[4] Conformal step coverage of (Ba,Sr)TiO3 films prepared by liquid source CVD using Ti(t-BuO)2(DPM)2 [J].

Kawahara, T ;

Matsuno, S ;

Yamamuka, M ;

Tarutani, M ;

Sato, T ;

Horikawa, T ;

Uchikawa, F ;

Ono, K .

JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1999, 38 (4B) :2205-2209

[5]

KIM K, 1994, NANOSTRUCT MATER, V4, P597, DOI 10.1016/0965-9773(94)90069-8

[6] GENERATION OF CHARGED DROPS OF INSULATING LIQUIDS BY ELECTROSTATIC SPRAYING [J].

KIM, K ;

TURNBULL, RJ .

JOURNAL OF APPLIED PHYSICS, 1976, 47 (05) :1964-1969

[7]

LOAN JF, 1995, B KOR VAC SOC M KOR, P40

[8] Low-temperature deposition of highly [100]-oriented MgO films using charged liquid cluster beam [J].

Rhee, SH ;

Yang, Y ;

Choi, HS ;

Myoung, JM ;

Kim, K .

THIN SOLID FILMS, 2001, 396 (1-2) :23-28

[9] FABRICATION OF ZNO THIN-FILMS USING CHARGED LIQUID CLUSTER BEAM TECHNIQUE [J].

RYU, CK ;

KIM, K .

APPLIED PHYSICS LETTERS, 1995, 67 (22) :3337-3339

[10] Synthesis and dielectric characteristic of Ba1-xSxTiO3 thin films-based strontium-barium alkoxides derivatives [J].

Tian, HY ;

Luo, WG ;

Pu, XH ;

He, XY ;

Qiu, PS ;

Ding, AL .

MATERIALS CHEMISTRY AND PHYSICS, 2001, 69 (1-3) :166-171

← 1 2 →