Plasma polymer films from sputtered polyimide

被引：24

作者：

Choukourov, A. ^{[1
]}

Hanus, J. ^{[1
]}

Kousal, J. ^{[1
]}

Grinevich, A. ^{[1
]}

Pihosh, Y. ^{[1
]}

Slavinska, D. ^{[1
]}

Biederman, H. ^{[1
]}

机构：

[1] Charles Univ, Fac Math & Phys, Dept Macromol Phys, CR-18000 Prague, Czech Republic

来源：

VACUUM | 2006年 / 81卷 / 04期

关键词：

thin polyimide-like films; magnetron sputtering; glow discharge; polyimide; VAPOR-DEPOSITION POLYMERIZATION; STRUCTURE-PROPERTY CORRELATION; THIN-FILMS; GLOW-DISCHARGE; NETWORKS;

D O I：

10.1016/j.vacuum.2006.07.010

中图分类号：

T [工业技术];

学科分类号：

120111 [工业工程];

摘要：

Deposition of plasma polymer films by r.f. magnetron sputtering of polyimide in an atmosphere of argon, nitrogen and in a self-sputtering mode is studied. In situ analytical techniques are applied to monitor the composition of both plasma and growing film during the deposition. A co-evaporation regime is observed at higher applied powers. Such a regime is characterized by a significant increase in deposition rate of plasma polymer films. In addition CO-based groups appear in the plasma volume and in the resulting films. The films deposited in a pulsed mode are similar in composition to those deposited in the continuous regime at equivalent power. The plasma polymer films are found to be stable to short-term oxidation in air. (c) 2006 Elsevier Ltd. All rights reserved.

引用

页码：517 / 526

页数：10

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