Tunable photonic strength in porous GaP

被引:33
作者
Rivas, JG
Lagendijk, A
Tjerkstra, RW
Vanmaekelbergh, D
Kelly, JJ
机构
[1] Univ Twente, Fac Appl Phys, NL-7500 AE Enschede, Netherlands
[2] Univ Amsterdam, Van der Waals Zeeman Inst, NL-1018 XE Amsterdam, Netherlands
[3] Univ Utrecht, Debye Inst, NL-3508 TA Utrecht, Netherlands
关键词
D O I
10.1063/1.1485316
中图分类号
O59 [应用物理学];
学科分类号
摘要
The light-scattering properties of porous gallium phosphide, prepared by electrochemical etching, are investigated. We show that the photonic strength of the porous semiconductor can be tuned from weak to extremely strong. This tunability is related to the density and size of the pores, which are controlled by the dopant density of the GaP crystals, and the etching potential. Moreover, electrochemical etching does not introduce any significant optical absorption, which makes porous GaP suitable for many photonic applications. (C) 2002 American Institute of Physics.
引用
收藏
页码:4498 / 4500
页数:3
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