Expansion of a laser-produced silver plume in light background gases

被引:9
作者
Amoruso, S
Toftmann, B
Schou, J [1 ]
机构
[1] Riso Natl Lab, Dept Opt & Fluid Dynam, DK-4000 Roskilde, Denmark
[2] Univ Naples Federico II, Dipartimento Sci Fis, INFM, Unita Napoli, I-80126 Naples, Italy
[3] Univ Naples Federico II, Coherentia INFM, I-80126 Naples, Italy
来源
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING | 2004年 / 79卷 / 4-6期
关键词
D O I
10.1007/s00339-004-2759-y
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
The expansion of a silver ablation plume in a helium and an argon background gas has been studied over the pressure range 10(-6) to 1 mbar. The angular distribution of silver atoms deposited on an array of quartz-crystal microbalances as well as time-of-flight signals of the plume ions in both gases were measured. There is a distinct sharpening of the angular distribution of the ablated silver atoms in the helium gas within a narrow range from 0.2 to 0.4 mbar. In contrast, the width of the angular distribution in the argon gas increases throughout the interval. The time-of-flight signals show a peak of fast ions which gradually merges into a more complex structure.
引用
收藏
页码:1311 / 1314
页数:4
相关论文
共 20 条
[1]   Characterization of laser-ablation plasmas [J].
Amoruso, S ;
Bruzzese, R ;
Spinelli, N ;
Velotta, R .
JOURNAL OF PHYSICS B-ATOMIC MOLECULAR AND OPTICAL PHYSICS, 1999, 32 (14) :R131-R172
[2]  
AMORUSO S, 2004, IN PRESS PHYS REV E
[3]   GAS-DYNAMICS AND FILM PROFILES IN PULSED-LASER DEPOSITION OF MATERIALS [J].
ANISIMOV, SI ;
BAUERLE, D ;
LUKYANCHUK, BS .
PHYSICAL REVIEW B, 1993, 48 (16) :12076-12081
[4]  
Bauerle D., 2000, ADV TEXTS PHYS
[5]   Gas-dynamic effects of the interaction between a pulsed laser-ablation plume and the ambient gas: analogy with an underexpanded jet [J].
Bulgakov, AV ;
Bulgakova, NM .
JOURNAL OF PHYSICS D-APPLIED PHYSICS, 1998, 31 (06) :693-703
[6]  
Chrisey D. B., 1994, PULSED LASER DEPOSIT
[7]   Gas dynamics of laser ablation: Influence of ambient atmosphere [J].
Gusarov, AV ;
Gnedovets, AG ;
Smurov, I .
JOURNAL OF APPLIED PHYSICS, 2000, 88 (07) :4352-4364
[8]   Numerical study of the role of a background gas and system geometry in pulsed laser deposition [J].
Itina, TE ;
Katassonov, AA ;
Marine, W ;
Autric, M .
JOURNAL OF APPLIED PHYSICS, 1998, 83 (11) :6050-6054
[9]   INVESTIGATION OF THE ABLATED FLUX CHARACTERISTICS DURING PULSED-LASER ABLATION DEPOSITION OF MULTICOMPONENT OXIDES [J].
LICHTENWALNER, DJ ;
AUCIELLO, O ;
DAT, R ;
KINGON, AI .
JOURNAL OF APPLIED PHYSICS, 1993, 74 (12) :7497-7505
[10]  
LOWNDES DH, 1998, EXPT METHODS PHYS SC, V30, P475