Extreme ultraviolet interferometric measurements of diffraction-limited optics

被引：15

作者：

Goldberg, KA ^{[1
]}

Naulleau, P

Bokor, J

机构：

[1] Univ Calif Berkeley, Lawrence Berkeley Lab, Ctr Xray Opt, Berkeley, CA 94720 USA

[2] Univ Calif Berkeley, Dept EECS, Berkeley, CA 94720 USA

来源：

JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B | 1999年 / 17卷 / 06期

关键词：

D O I：

10.1116/1.590939

中图分类号：

TM [电工技术]; TN [电子技术、通信技术];

学科分类号：

0808 ; 0809 ;

摘要：

At-wavelength interferometric measurements of recently fabricated extreme ultraviolet (EUV) microstepper projection optics have revealed the highest performance for prototype EUV lithographic systems observed to date. The phase-shifting point diffraction interferometer is used to measure and align these two-mirror, multilayer-coated Schwarzschild optical systems designed with a numerical aperture of 0.088 and, operating at 13.4 nm wavelength. Root-mean-square wave front error magnitudes as small. as 0.60 nm have been achieved, actually exceeding the design tolerance set or these objectives. (C) 1999 American Vacuum Society. [S0734-211X(99)06106-5].

引用

页码：2982 / 2986

页数：5

共 16 条

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