Template-assisted patterning of nanoscale self-assembled monolayer arrays on surfaces

被引:25
作者
Gao, Han [1 ]
Gosvami, Nitya N. [1 ]
Deng, Jie [1 ]
Tan, Le-Shon [1 ]
Sander, Melissa S. [1 ]
机构
[1] Inst Mat Res & Engn, Singapore 117602, Singapore
关键词
D O I
10.1021/la060658b
中图分类号
O6 [化学];
学科分类号
0703 ;
摘要
We report a general, simple, and inexpensive approach to pattern features of self-assembled monolayers (SAMs) on silicon and gold surfaces using porous anodic alumina films as templates. The SAM patterns, with feature sizes down to 30 nm and densities higher than 10(10)/cm(2), can be prepared over large areas (> 5 cm(2)). The feature dimensions can be tuned by controlling the alumina template structure. These SAM patterns have been successfully used as resists for fabricating gold and silicon nanoparticle arrays on substrates by wet-chemical etching. In addition, we show that arrays of gold features can be patterned with 10-nm gaps between the dots.
引用
收藏
页码:8078 / 8082
页数:5
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