Observation of step configuration conversion on single-domain Si(001) 1x2 surface by scanning tunneling microscope

被引:1
作者
Zhou, JM [1 ]
Lin, N [1 ]
Guo, LW [1 ]
Zhang, MH [1 ]
Huang, Q [1 ]
Cue, N [1 ]
Chen, T [1 ]
机构
[1] HONG KONG UNIV SCI & TECHNOL,DEPT PHYS,KOWLOON,HONG KONG
关键词
D O I
10.1063/1.117298
中图分类号
O59 [应用物理学];
学科分类号
摘要
We have observed a conversion of step configuration of 3.5 degrees miscut Si(001) surface after depositing several monolayers of Ge by using a scanning tunneling microscope. For a 3.5 degrees miscut Si(001) surface, terraces are spaced by double-atom height steps and all dimer rows, either on the upper terrace or on the lower terrace of a step, are normal to the step edge, defined as single-domain (1 x 2) surface. After depositing 2 ML of Ge, the surface is still single domain, but dimer rows have changed their direction, running parallel to the step edge and single domain (2 x 1) appeared. The reason for such conversion is attributed to the strain that existed on the epilayer of Ge. (C) 1996 American Institute of Physics.
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页码:3336 / 3338
页数:3
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