共 33 条
[1]
BRUGGEMAN DAG, 1935, ANN PHYS, V416, P665, DOI DOI 10.1002/ANDP.19354160802
[2]
A FULLY AUTOMATED HOT-WALL MULTIPLASMA-MONOCHAMBER REACTOR FOR THIN-FILM DEPOSITION
[J].
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A-VACUUM SURFACES AND FILMS,
1991, 9 (04)
:2331-2341
[6]
Damon-Lacoste J., 2007, THESIS ECOLE POLYTEC
[10]
ELECTRONIC-STRUCTURE STUDIES OF PLASMA-DEPOSITED AMORPHOUS-SILICON
[J].
PHILOSOPHICAL MAGAZINE B-PHYSICS OF CONDENSED MATTER STATISTICAL MECHANICS ELECTRONIC OPTICAL AND MAGNETIC PROPERTIES,
1986, 54 (05)
:335-342