Hydrogen and doping issues in wide band gap semiconductors

被引:11
作者
Chevallier, J [1 ]
机构
[1] CNRS, Lab Phys Solides & Cristallogenese, F-92195 Meudon, France
来源
MATERIALS SCIENCE AND ENGINEERING B-SOLID STATE MATERIALS FOR ADVANCED TECHNOLOGY | 2000年 / 71卷 / 71期
关键词
hydrogen; wide band gap semiconductors; dopant; local vibrational modes; diffusion;
D O I
10.1016/S0921-5107(99)00350-5
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Hydrogen may be non-intentionally incorporated in wide band gap semiconductors when they are grown or processed under hydrogen-rich ambients. A possible consequence is a passivation of the dopants. The diffusion of hydrogen in boron doped diamond is presented to illustrate how hydrogen diffusion studies can evidence the existence of H-dopant interactions. Then, the hydrogen-dopant complexes will be investigated in wide band gap II-VT semiconductors and in GaN by infrared vibrational spectroscopy. Complex dissociation and dopant reactivation will finally be discussed together with hydrogen out-diffusion results, (C) 2000 Elsevier Science S.A. All rights reserved.
引用
收藏
页码:62 / 68
页数:7
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