Nanotribological characterization of digital micromirror devices using an atomic force microscope

被引:43
作者
Liu, HW
Bhushan, B
机构
[1] Ohio State Univ, Dept Mech Engn, Nanotribol Lab Informat Storage, Columbus, OH 43210 USA
[2] Ohio State Univ, Dept Mech Engn, MEMS, NEMS, Columbus, OH 43210 USA
关键词
digital light processing (DLP); digital micromirror device (DMD); atomic force microscope (AFM); stiction; friction; wear; self-assembled monolayer (SAM);
D O I
10.1016/j.ultramic.2003.11.016
中图分类号
TH742 [显微镜];
学科分类号
摘要
Texas Instruments' digital micromirror device (DMD) comprises an array of fast digital micromirrors, monolithically integrated onto and controlled by an underlying silicon memory chip. The DMD is one of the few success stories in the emerging field of MEMS. In this study, an atomic force microscope (AFM) has been used to characterize the nanotribological properties of the elements of the DMD. An AFM methodology was developed to identify and remove micromirrors of interest. The surface roughness, adhesion, friction, and stiffness properties of the DMD elements were studied. The influence of relative humidity and temperature on the behavior of the DMD element surfaces was also investigated. Potential mechanisms for wear and stiction are discussed in light of the findings. (C) 2004 Elsevier B.V. All rights reserved.
引用
收藏
页码:391 / 412
页数:22
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