Thermal oxidation of sintered beta-sialon (z=3) ceramics in atmospheres with water vapor

被引:4
作者
Kiyono, H [1 ]
Shimada, S [1 ]
机构
[1] Hokkaido Univ, Grad Sch Engn, Sapporo, Hokkaido 0608628, Japan
来源
EURO CERAMICS VIII, PTS 1-3 | 2004年 / 264-268卷
关键词
beta-sialon; oxidation; water vapor; diffusion limiting rate; aluminosilicate glass;
D O I
10.4028/www.scientific.net/KEM.264-268.893
中图分类号
TQ174 [陶瓷工业]; TB3 [工程材料学];
学科分类号
0805 ; 080502 ;
摘要
Thermal oxidation of beta-sialon (Si6-zAlzOzN8-z, z = 3) ceramic was investigated at 1300 to 1600degreesC in dry (Ar/O-2= 90/10 kPa), wet O-2 (Ar/O-2/H2O = 80/10/10 kPa) and wet (Ar/H2O = 90/10 kPa) atmospheres. Oxidation was followed from weight gains using thermogravimetry and the oxidized sample was characterized by scanning electron microscope, electron probe microanalysis and X-ray powder diffraction. Oxidation kinetics in the three atmospheres were represented by a parabolic rate model except for at 1600degreesC. The wet and wet 02 oxidation rates were greater than the dry oxidation, the degree decreasing with rising temperature from 1300 to 1500degreesC, while wet and wet O-2 oxidation at 1600degreesC was even faster again than the dry oxidation. It was found that the scale formed by the dry, wet and wet O-2 oxidation consisted of mullite and cristobalite at 1300 - 1500degreesC and of mullite and SiO2 rich aluminosilicate glass at 1600degreesC.
引用
收藏
页码:893 / 896
页数:4
相关论文
共 8 条
[1]   OXIDATION OF CHEMICALLY-VAPOR-DEPOSITED SILICON-NITRIDE AND SINGLE-CRYSTAL SILICON [J].
CHOI, DJ ;
FISCHBACH, DB ;
SCOTT, WD .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1989, 72 (07) :1118-1123
[2]   SIAION CERAMICS [J].
EKSTROM, T ;
NYGREN, M .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1992, 75 (02) :259-276
[3]  
Kiyono H, 2001, J ELECTROCHEM SOC, V148, pB86, DOI 10.1149/1.1339866
[4]   OXIDATION-KINETICS OF CHEMICALLY VAPOR-DEPOSITED SILICON-CARBIDE IN WET OXYGEN [J].
OPILA, EJ .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 1994, 77 (03) :730-736
[5]   THE OXIDATION-KINETICS OF BETA-SIALON CERAMICS [J].
PERSSON, J ;
NYGREN, M .
JOURNAL OF THE EUROPEAN CERAMIC SOCIETY, 1994, 13 (05) :467-484
[6]   Silicon nitride and related materials [J].
Riley, FL .
JOURNAL OF THE AMERICAN CERAMIC SOCIETY, 2000, 83 (02) :245-265
[7]  
ROBECCA AL, 1994, EFECT H2O CO2 F DENS, V30, P331
[8]   HIGH-TEMPERATURE OXIDATION OF SILICON NITRIDE-BASED CERAMICS BY WATER-VAPOR [J].
SATO, T ;
HARYU, K ;
ENDO, T ;
SHIMADA, M .
JOURNAL OF MATERIALS SCIENCE, 1987, 22 (07) :2635-2640