Optical properties of transparent ZnO-SnO2 thin films deposited by filtered vacuum arc

被引:19
作者
Cetinorgu, E.
Goldsmith, S.
Boxman, R. L.
机构
[1] Tel Aviv Univ, Elect Discharge & Plasma Lab, IL-69978 Tel Aviv, Israel
[2] Cukurova Univ, Fac Arts & Letters, Dept Phys, TR-01330 Adana, Turkey
[3] Tel Aviv Univ, Sch Phys & Astron, Raymond & Beverly Sackler Fac Exact Sci, IL-69978 Tel Aviv, Israel
[4] Tel Aviv Univ, Fleischman Fac Engn, IL-69978 Tel Aviv, Israel
关键词
D O I
10.1088/0022-3727/39/9/024
中图分类号
O59 [应用物理学];
学科分类号
摘要
ZnO-SnO2 films were deposited onto glass substrates by filtered vacuum arc deposition. The source was equipped with a 70 at% Zn and 30 at% Sn cathode that was the source of Zn and Sri ion beam. Arc current was 200-300 A. The oxygen background pressure was 4-8 mTorr. The deposition time was 60 or 120 s, resulting in film thickness in the range 100-900 nm. The maximum deposition rate was 7.6 nm s(-1). All films were found to be amorphous. The transmission of the film in the VIS was 80%-90%, affected by interference. The refractive index and the extinction coefficient were determined from the measured optical transmission in the range 300-1100 nm by fitting a theoretically calculated film transmission to the measured one, using a single oscillator model. The values of n and k were determined from spectroscopic ellipsometry data and were in the ranges 2.38-1.97 and 0.24-0.013, respectively, depending on wavelengths and deposition parameters. The optical band gap (E-g) was determined by the dependence of the absorption coefficient on the photon energy at short wavelengths. Its values were in the range 3.5-3.62 eV, depending on the deposition conditions.
引用
收藏
页码:1878 / 1884
页数:7
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