Biaxial testing of nanoscale films on compliant substrates: Fatigue and fracture

被引:34
作者
Alaca, BE [1 ]
Selby, JC [1 ]
Saif, MTA [1 ]
Sehitoglu, H [1 ]
机构
[1] Univ Illinois, Dept Mech & Ind Engn, Urbana, IL 61801 USA
关键词
D O I
10.1063/1.1488685
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
Two problems of technological importance for microelectromechanical systems (MEMS) and microelectronics industry are addressed: fatigue of thin films and nanoscale film cracking. A device is described that can (1) conduct biaxial fatigue tests on thin films and (2) be utilized to study fracture patterns in nanoscale coatings under biaxial stress state. Thin-film specimens, in the form of circular membranes, are exposed to cyclic pressures between two fixed pressure limits. Corresponding pressure and specimen deflection are measured. Experimental results, including hysteresis loops spanning deflections of 15-50 mum are presented for 4.6-mum-thick polyimide films. Furthermore, the evolution of crack patterns in a 150-nm-thick Al film deposited on a polyimide substrate is studied. Critical mode I stress intensity factor for Al is extracted from experimental results. (C) 2002 American Institute of Physics.
引用
收藏
页码:2963 / 2970
页数:8
相关论文
共 35 条
[11]  
Hencky H., 1915, Zeitschrift fur Mathematik und Physik, V63, P311
[12]  
Higo Y, 2000, MATER RES SOC SYMP P, V605, P241
[13]   COMPLEX STRESSING OF POLYETHYLENE [J].
HOPKINS, IL ;
BAKER, WO ;
HOWARD, JB .
JOURNAL OF APPLIED PHYSICS, 1950, 21 (03) :206-213
[14]   MIXED-MODE CRACKING IN LAYERED MATERIALS [J].
HUTCHINSON, JW ;
SUO, Z .
ADVANCES IN APPLIED MECHANICS, VOL 29, 1992, 29 :63-191
[15]  
KERN W, 1983, RCA ENG, V28, P99
[16]   Thermal cycling fatigue and deformation mechanism in aluminum alloy thin films on silicon [J].
Koike, J ;
Utsunomiya, S ;
Shimoyama, Y ;
Maruyama, K ;
Oikawa, H .
JOURNAL OF MATERIALS RESEARCH, 1998, 13 (11) :3256-3264
[17]   Desiccation of a sensitive clay: field experimental observations [J].
Konrad, JM ;
Ayad, R .
CANADIAN GEOTECHNICAL JOURNAL, 1997, 34 (06) :929-942
[18]   Bosch deep silicon etching: Improving uniformity and etch rate for advanced MEMS applications [J].
Laermer, F ;
Schilp, A ;
Funk, K ;
Offenberg, M .
MEMS '99: TWELFTH IEEE INTERNATIONAL CONFERENCE ON MICRO ELECTRO MECHANICAL SYSTEMS, TECHNICAL DIGEST, 1999, :211-216
[19]   NANOSCALE DEFORMATIONS OF POLYIMIDE WITH A FORCE MICROSCOPE [J].
LIN, JA ;
UNERTL, WN .
JOURNAL OF ADHESION SCIENCE AND TECHNOLOGY, 1994, 8 (08) :913-927
[20]  
MASEEH F, 1989, POLYIMIDES : MATERIALS, CHEMISTRY AND CHARACTERIZATION, P575