MC simulation of strained-Si MOSFET with full-band structure and quantum correction

被引:30
作者
Fan, XF [1 ]
Wang, X
Winstead, B
Register, LF
Ravaioli, U
Banerjee, SK
机构
[1] Univ Texas, Microelect Res Ctr, Austin, TX 78758 USA
[2] Univ Texas, Dept Elect & Comp Engn, Austin, TX 78758 USA
[3] Motorola Inc, Austin, TX 78721 USA
[4] Univ Illinois, Urbana, IL 61801 USA
关键词
full-band Monte Carlo (MC); MOSFET simulations; quantum effects; SiGe heterostructures; strained-silicon;
D O I
10.1109/TED.2004.828296
中图分类号
TM [电工技术]; TN [电子技术、通信技术];
学科分类号
0808 ; 0809 ;
摘要
A new two-dimensional full-band Monte Carlo simulator, "Monte Carlo University of Texas" (MCUT) is introduced and described in this paper. MCUT combines some of the best features of semiclassical MC device simulation including full-band structure and flexibility of scattering processes, with generality of material composition and the ability to address degeneracy breaking among energy valleys and the associated effects on scattering and transport due to quantum confinement and strain effects. The latter capability derives from extension of a prior crystal-momentum-independent self-consistent Poisson-Schrodinger-based quantum corrected potential, to a valley dependent quantum correction via, in part, a new modeling concept of "effective strain" within the full-band structure code. Low field mobility simulation results for large tensile strained-Si channel nMOSFETs and unstrained-Si channel nMOSFETs device are compared with other simulation methods and experimental data to demonstrate the effectiveness of the approach, and the abilities to simulate high-field transport and transport in devices of a few 10s of nanometer channel lengths are briefly demonstrated.
引用
收藏
页码:962 / 970
页数:9
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