Double-biprism electron interferometry

被引：114

作者：

Harada, K ^{[1
]}

Tonomura, A

Togawa, Y

Akashi, T

Matsuda, T

机构：

[1] Inst Phys & Chem Res, Frontier Res Syst, Hatoyama, Saitama 3500395, Japan

[2] Hitachi Ltd, Adv Res Lab, Hatoyama, Saitama 3500395, Japan

[3] Hitachi Instruments Serv Co Ltd, Shinjuku Ku, Tokyo 1600004, Japan

[4] Hitachi Sci Syst Ltd, Musashino Lab, Tokyo 1920031, Japan

来源：

APPLIED PHYSICS LETTERS | 2004年 / 84卷 / 17期

关键词：

D O I：

10.1063/1.1715155

中图分类号：

O59 [应用物理学];

学科分类号：

摘要：

Electron holography based on two electron biprisms was developed. The upper biprism was installed just on the image plane of the objective lens, and the lower one was set between the crossover point and image plane of the magnifying lens. This system was able to control two important parameters of the hologram-fringe space and width of interference region-independently. The system enabled us to perform electron holography and interferometry more flexibly. We confirmed the good performance of the system and did preliminary applications using a 1-MV field-emission electron microscope. (C) 2004 American Institute of Physics.

引用

页码：3229 / 3231

页数：3